A great polishing product, depent on the usage, it could use to be the final-stage uasge, or very fast pre-finish-stage usage. Because it's tablet proepritity/shpe, it has very fast removel rate, even it is at 250nm.
Al2O3
Size :1~2um，1~2微米
(Fused/熔融)
Slurry type / 已調和成研磨液
pH: Base type / 鹼性
A great polishing product. This can be a very good final polish agent depent on the requirement. This removel speed is slower then tablet product, but with better surface result.
CeO
Size : 120nm，120納米
Slurry type / 已調和成研磨液
pH: Base type / 鹼性
A great final-stage polishing agent for all glass-type materials. This line of product has good powder dispersion ability, and a good balance on polishing efficiency & surface quality. Its unique characteristics provide both physical & chemical polishing simultaneously to an object at once.
ZrO
Size : 1~2um，1~2微米
Slurry type / 已調和成研磨液
pH: Base type / 鹼性
Another great agent for polish. Depent on the material needed to be polished, this has great speed. However this is more expensive at current stage.
